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職責(zé)描述：
1.負(fù)責(zé)化學(xué)機(jī)械研磨和電化學(xué)無應(yīng)力拋光設(shè)備測(cè)試研發(fā)和創(chuàng)新；
Responsible for CMP and electrochemistry test, research, development and innovation;
2.負(fù)責(zé)化學(xué)機(jī)械研磨與無應(yīng)力拋光設(shè)備集成的測(cè)試，研發(fā)和創(chuàng)新；
Responsible for CMP and SFP integrated process test, research, development and innovation;
3.負(fù)責(zé)機(jī)臺(tái)日常維護(hù)測(cè)試，測(cè)試和可靠性測(cè)試；
Responsible for tool daily maintenance，test and reliability test;
4.負(fù)責(zé)設(shè)備相關(guān)技術(shù)文獻(xiàn)檢索，分析和撰寫；
Responsible for relevant technology document search, analysis and writing;
5.與機(jī)械，電氣，軟件工程師合作，負(fù)責(zé)機(jī)臺(tái)設(shè)計(jì)，評(píng)估，測(cè)試，和改進(jìn)
Responsible for coworking with mechanical, electrical, software engineers to support tool design, evaluation, test, and improvement;
6.與客戶合作，安裝，調(diào)試，驗(yàn)收機(jī)臺(tái)以及維保
Cooperate with customer to install，evaluate，qualify tool and maintenance，service.
任職要求：
1. 5-8年CMP先進(jìn)封裝FAB、或設(shè)備廠商設(shè)備工作經(jīng)驗(yàn)；
5~8years working experience in related field such as CMP equipment in FAB or in an advanced packaging factory or tool vendors;
2. 熟悉化學(xué)機(jī)械研磨CMP設(shè)備研磨和清洗原理，了解inline/offline工藝，
Be familiar with the principle of chemical mechanical polishing (CMP) equipment
polishing and cleaning，understand the inline/offline processes.
3. 具有一定項(xiàng)目管理能力；
Good project management ability;
4. 碩士或本科，理工科相關(guān)專業(yè)；
Master or bachelor degree, major in science &technology or mechanical;
5. 擅長(zhǎng)溝通并能適應(yīng)一定程度加班；
Good at communication and for overtime work to complete tasks on time.
6. 有先進(jìn)工藝節(jié)點(diǎn)經(jīng)驗(yàn)優(yōu)先
Experience in advanced process technology is preferred.